2024年4月11日发(作者：)

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专利名称：Production manner and liquid crystal device

of rubbing device and liquid crystal device

发明人：山田 健一,矢崎 正幸

申请号：JP1999338159

申请日：19991129

公开号：JP3835087B2

公开日：20061018

摘要：PROBLEM TO BE SOLVED: To provide a method of rubbing liquid crystal device

always ensuring stable display characteristics and a rubbing device used for it. SOLUTION:

The rubbing device 48 is provided with a stage 40 on which a substrate 10 with an

alignment layer formed on its one surface is mounted, a rubbing roller 41 brought into

contact with the substrate 10 to rubbing-treat the alignment layer, a torque detection

circuit 42 to detect the rotational torque of the rubbing roller at an end part of the

substrate and a motor moving up and down to move the stage 40 so as to maintain the

rotational torque within a specified range. As the rotational torque is thereby set up

within the specified range for the individual substrates, the substrates can be rubbing-

treated always with the constant rotational torque value even when, for example, a

plurality of substrates with variation in thickness are treated.

申请人：セイコーエプソン株式会社

地址：東京都新宿区西新宿２丁目４番１号

国籍：JP

代理人：上柳 雅誉,藤綱 英吉,須澤 修

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